Accelerated Carrier Recombination by Grain Boundary/Edge Defects in MBE Grown Transition Metal Dichalcogenides
Abstract
Defect-carrier interaction in transition metal dichalcogenides (TMDs) plays important roles in carrier relaxation dynamics and carrier transport, which determines the performance of electronic devices. With femtosecond laser time-resolved spectroscopy, we investigated the effect of grain boundary/edge defects on the ultrafast dynamics of photoexcited carrier in molecular beam epitaxy (MBE)-grown MoTe2 and MoSe2.Wefound that, comparing with exfoliated samples, the carrier recombination rate in MBE grown samples accelerates by about 50 times.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 04, 2018
- Accession Number
- AD1072800
Entities
People
- Amritesh Rai
- Anupam Roy
- Feng He
- Hema C. Movva
- Ke Chen
- Sanjay K. Banerjee
- Xianghai Meng
- Yaguo Wang
Organizations
- University of Texas at Austin