Advanced Multilayer Physical Vapor Deposition Tool

Abstract

PI Maria received ARO support for a high throughput dedicated physical vapor deposition tool for the production of polaritonic conducting metal oxides and reactive nanolaminates with in situ thickness control, stable sputter cathode sources, the ability to control acceptor and donor doping in the range between high 1017cm-3 and mid 1020 cm-3, and an integrated variable pressure annealing station. The configuration proposed is designed specifically to propel the new NCSU- led MURI program Multi-modal Energy Flow at Atomically Engineered Interfaces but will also benefit a broad set of existing ONR, DoD, and NSF research programs.

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Document Details

Document Type
Technical Report
Publication Date
Dec 14, 2018
Accession Number
AD1078084

Entities

People

  • Jon-Paul Maria

Organizations

  • North Carolina State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemistry
  • Electromagnetic Radiation
  • Engineering
  • Films
  • High Temperature
  • Instrumentation
  • Materials
  • Materials Processing
  • Materials Science
  • Metal Oxides
  • Metals
  • Physical Vapor Deposition
  • Plasmonic Devices
  • Polaritons
  • Power Supplies
  • Sputtering
  • Vapor Deposition

Fields of Study

  • Physics

Readers

  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Research Science/Academic Research
  • Thin Film Deposition Science.