Acquisition of an Advanced Atomic Layer Deposition System for Research at Nanoscale for Energy Harvesting and Nanoelectronics at Alabama A and M University
Abstract
The major goal of this project is to acquire a state-of-the-art KJLC 150-LX atomic layer deposition (ALD) system to enable researchers at the Alabama A and M University (AAMU) to fabricate devices at the micro- and nanoscales. The capability of fabricating materials and devices at nanoscale is critical not only for the advancement of science and technology, but also for the training of the future scientific workforce. One of the key capabilities for micro and nanofabrication is the ability to grow nanoscale thin-film materials. Physical vapor deposition (PVD) and chemical vapor deposition (CVD) are two major methods to grow thin-film materials. Our PVD thin-film deposition capability is excellent: we have both sputtering deposition system and thermal/e-beam evaporation system for physical vapor deposition (PVD) of thin-film materials. However, we didnt have any chemical vapor deposition (CVD) system in our clean room. CVD has advantage over PVD such as having higher film quality and better film conformity, which are critical in the fabrication at nanoscales. The atomic layer deposition (ALD) is chemical vapor deposition (CVD). The requested atomic layer deposition system is necessary companion instruments to our 2,500 sq. ft class 1,000 clean-room fabrication tools. The acquisition of the ALD system would propel nanoscale science and technology at AAMU serving northern Alabama to new frontiers.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 09, 2019
- Accession Number
- AD1078140
Entities
People
- Kaveh Heidary
- Satilmis Budak
- Shujun Yang
- Zhigang Xiao