A New Approach to Develop Atomic Scale Understanding of Radiation Effects in Emerging Nanoscale Memory and Logic Materials and Devices
Abstract
We have utilized several electrically detected magnetic resonance (EDMR) techniques to develop an atomic scale understanding of radiation damage (and other) related reliability problems in several systems of great importance in emerging memory and logic devices. The EDMR techniques utilized in the study were spin dependent recombination (SDR) and spin dependent trap assisted tunneling (SDTAT). In our study we exploited the near field and frequency independent sensitivity of both SDR and SDTAT EDMR. Systems and materials involved in the study included tri-gate (also called FinFET) metal oxide silicon field effect transistors (MOSFETs), low dielectric constant, so-called low -k dielectrics, utilized in interlayer dielectrics of present-day high performance integrated circuitry, SiGe MOSFETs, and HfO2 resistive random-access memories.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 2021
- Accession Number
- AD1128393
Entities
People
- Patrick M. Lenahan
Organizations
- Pennsylvania State University