Nanoscale Electronics Development and Fabrication (RAPIDFAB)

Abstract

The objective of this effort was to provide nanoscale electronic device design, layout, fabrication and testing services for AFRL projects and programs. This effort leveraged multiple ongoing efforts between SUNY Polytechnic Institute (SUNY Poly) and AFRL, including, but not limited to CMOS and resistive memory (ReRAM, memristor) platforms. The ultimate goal was delivery of cutting-edge nanoelectronic devices/systems and performance data to AFRL for support of R and D programs. The major outcomes of this effort include development of novel memristive materials/stacks, extending 300mm wafer based integration of CMOS/ReRAM to the far back end of the line (BEOL), characterization of CMOS/ReRAM device performance, and finally, evaluation of the impact of device variability and methods to mitigate the effects of such variability.

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Document Details

Document Type
Technical Report
Publication Date
Apr 21, 2021
Accession Number
AD1128496

Entities

People

  • Nathaniel C Cady

Organizations

  • SUNY Polytechnic Institute

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Air Force Research Laboratories
  • Artificial Intelligence
  • Complementary Metal-Oxide Semiconductors
  • Electronics
  • Engineering
  • Fabrication
  • Field Effect Transistors
  • Field Programmable Gate Arrays
  • Graphical User Interface
  • Materials
  • Measurement
  • Metal Oxide Semiconductors
  • Military Research
  • Neural Networks
  • New York
  • Oxides
  • Patent Applications
  • Resistance
  • Semiconductors
  • Standards
  • United States

Readers

  • Integrated Circuit Design and Technology.
  • Research Science/Academic Research

Technology Areas

  • Microelectronics