A Combined Photo/Electrochemical Reductive Pathway Towards Enhanced PFAS Degradation
Abstract
Perfluoroalkyl substances (PFAS) have been extensively used across multiple industries [1]. Their amphiphilic and inert nature has made them critical components in many commercial and industrial processes. including fire-fighting foams, packaging, and water repellent coatings and materials [2], and they have subsequently entered the environment through multiple routes: airborne dust, [3] landfill leachate, [4]and industrial and municipal wastewater [5]. The properties that make these compounds attractive, also make them environmentally recalcitrant and mobile [6]. This resistance to degradation arises from the high thermal stability of the carbon-fluoride (C-F) bond, the rigidity of the perfluoroalkyl chain and the lack of reactive substituents in the PFAS molecule [7]. PFAS consist of a long aliphatic hydrophobic tail saturated with F atoms attached to a hydrophilic head group.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 28, 2020
- Accession Number
- AD1134386
Entities
People
- Bryan M. Wong
- David Jassiby
- David M. Cwiertny
Organizations
- University of California
- University of Iowa