Development of Beta Gallium Oxide on Large Area Substrates
Abstract
In this program, we have explored high-quality homoepitaxy growth with beta-Ga2O3 using conventional PAMBE and MOCATAXY on different crystal orientations, and MOCVD (with Agnitron Collaboration) for high-mobility epitaxial films. We have also developed device design and processing with Ga2O3 for high-power applications.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 27, 2021
- Accession Number
- AD1142300
Entities
People
- James A. Speck
Organizations
- University of California, Santa Barbara