Plasma-Enhanced Chemical Vapor Deposition on Diamond Powders to Enable Next-Generation Hard Armor

Abstract

Coating of diamond powders with silicon dioxide (SiO2) was explored using plasma-enhanced chemical vapor deposition (PECVD). These coatings were investigated as a possible oxygen barrier to aid in the consolidation of diamond ceramic composites. A PECVD system was modified to accommodate a fluidized bed to agitate powders during the deposition. A hexamethyldisiloxane vapor precursor source was constructed and installed on the system. The chemistry was tuned via input gas ratios and the resultant film chemistry was measured via X-ray photoelectron spectroscopy (XPS). Deposition rates and through thickness chemistry were investigated with focused ion beam cross-sectioning and XPS sputter depth profiling. The SiO2 deposition rates were found to be 10 nm per minute and through-thickness chemistry was found to be uniform.

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Document Details

Document Type
Technical Report
Publication Date
Sep 21, 2021
Accession Number
AD1148700

Entities

People

  • Thomas Parker

Organizations

  • United States Army

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Beds (Process Engineering)
  • Ceramic Materials
  • Ceramic Matrix Composites
  • Chemical Vapor Deposition
  • Chemistry
  • Coatings
  • Composite Materials
  • Crystal Structure
  • Electron Microscopy
  • Films
  • High Resolution
  • Ion Beams
  • Low Density
  • Materials
  • Materials Processing
  • Materials Science
  • Silicon Carbide
  • Silicon Dioxide
  • Vapor Deposition
  • X Ray Photoelectron Spectroscopy

Readers

  • Materials Science and Engineering.
  • Nanocomposite Materials Science
  • Nanofabrication and Microfabrication.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene