Test Report: Oximeter Headband Initial Characterization Test on Form, Fit, and Function

Abstract

The oximeter headband is a new physiological status monitoring system developed by Massachusetts Institute of Technology Lincoln Laboratory (MIT LL), Lexington, Massachusetts and the Institute for Advanced Functional Fabrics of America (AFFOA), Cambridge, Massachusetts. It was tested for form, fit, and function during an internal test held at MIT LL. The oximeter headband system consists of a custom made, textile-based headband. It is a noninvasive, non-subcutaneous, and non-radiation harming device that only maintains surface contact with the skin. It has been specifically designed to meet the needs of the military. The test described in this report assesses the first field-portable prototype of the oximeter headband device. Data was collected from eight test participants in two test scenarios, a functional evaluation, and a form and fit assessment. Results from the functional evaluation show that the oximeter headband device is capable of providing valid SpO2 estimates at varying activity levels (sit, walk, and run) with a residual sum of squares (RSS) as low as 27, however there is inconsistency in validity across the entire data set. In some instances, RSS was as high as 3.1E4. Further characterization is necessary to better understand the source of variation. In regards to form and fit, the oximeter headband was acceptable to wear as currently constructed. However, tightness of fit was the main concern with regard to comfort and user acceptability. Form was rated as a 4.9 for comfort on a seven-point discomfort/comfort scale, with the a 5 indicating 'slightly comfortable.' Fit was scored a 4.3 with a score of 4 equal to 'moderately good' and a score of 5 equal to 'extremely good.' The results of this initial evaluation provide a starting point for more extensive evaluation of form, fit, and function.

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Document Details

Document Type
Technical Report
Publication Date
Oct 14, 2021
Accession Number
AD1150130

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  • David C. Maurer
  • Lauren E. Cantley
  • M. Ibanescu
  • Tairan Wang
  • William J. Tharion

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  • Massachusetts Institute of Technology

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