A Review of Reactive Ion Etching of Glass Materials

Abstract

This report explores the published parameters for reactive ion etching (RIE) of various types of glassy materials, including those used to fabricate random antireflective surface structures (rARSS). The glasses included in this report are fused silica, borosilicate glass, aluminosilicate glass, as well as chalcogenide and phosphate glasses.

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Document Details

Document Type
Technical Report
Publication Date
Oct 04, 2021
Accession Number
AD1150342

Entities

People

  • Austin F. Moore
  • Jasbinder S. Sanghera
  • Jesse A. Frantz
  • Lynda E. Busse

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Aspect Ratio
  • Chalcogenide Glass
  • Chemical Reactions
  • Chemical Synthesis
  • Chemistry
  • Coatings
  • Fabrication
  • Glass
  • High Pressure
  • Materials
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • Materials Testing
  • Metallic Nanoparticles
  • Metals
  • Nanoparticles
  • Nanostructures
  • Optical Materials
  • Silica Glass

Fields of Study

  • Materials science

Readers

  • Nanofabrication and Microfabrication.
  • Surface Coatings Technology.
  • Systems Analysis and Design