Photoresist Optimization for Lead Zirconate Titanate (PZT) Processing and Devices

Abstract

This study focused on resolving defects in photoresist patterns after UV curing that affect device feature quality and electromechanical performance. Designs of experiments (DOEs) were performed to obtain photoresist profiles for the AZ5214 positive photoresist process with a 2,000-rpm spin during dispense. These profiles were then analyzed by a confocal microscope, a stylus profilometer, and scanning electron microscopy. The specific problems with the patterns revealed by the DOE and analysis are discussed. A plan forward is then discussed listing options that could lead to further photoresist and devicefeature optimization for enhanced performance.

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Document Details

Document Type
Technical Report
Publication Date
Sep 13, 2022
Accession Number
AD1180061

Entities

People

  • Daniel M. Potrepka

Organizations

  • United States Army Research Laboratory

Tags

DTIC Thesaurus Topics

  • Chemical Reactions
  • Confocal Microscopy
  • Detectors
  • Electron Beams
  • Electron Microscopy
  • Electrons
  • Experimental Design
  • Films
  • Frequency
  • Hardening
  • Lead Zirconate Titanates
  • Materials
  • Microelectromechanical Systems
  • Microscopes
  • Microscopy
  • Military Research
  • Optimization
  • Radiation
  • Scanning Electron Microscopy
  • Titanates
  • Zirconates

Readers

  • Materials Science and Engineering.
  • Nanofabrication and Microfabrication.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems