Multiband Spectropolarimetric Signature Analysis for Man-Made Material Delineation Data Management Plan

Abstract

This research effort seeks to understand how material surface metrics relate to laboratory and aerial field spectropolarimetric measurements, which will be used to inform material separability. ERDC researchers, in collaboration with scientists from C5ISR, will explore this relationship through analysis of one specific material surface metric, the refractive index, and multiband spectropolarimetric data. The aerial data were collected in the field during a prior SBIR that ended in 2019. Measurements and refractive index values will be collected of various materials in the laboratory also present in the imagery. The relationship between the refractive index and laboratory and field measurements will be calculated in the longwave infrared using a technique developed by Pantuso et al. (2018). Separability measures will be examined using multivariate statistics. This research will be the first effort to inform the Army how to analyze passive spectropolarimetric data in order to distinguish man-made materials that otherwise may be too similar in traditional multispectral imagery to differentiate. Techniques to relate material surface metrics to laboratory and field data will better inform future research in image science and object recognition.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 2022
Accession Number
AD1186977

Entities

People

  • Sarah J. Becker

Organizations

  • Engineer Research and Development Center

Tags

DTIC Thesaurus Topics

  • Acquisition
  • Computer Vision
  • Copyrights
  • Data Acquisition
  • Data Management
  • Data Sets
  • Economic Security
  • Intellectual Property
  • Law
  • Materials
  • Measurement
  • Object Recognition
  • Operating Systems
  • Recognition
  • Refractive Index
  • Security
  • Standards

Fields of Study

  • Physics

Readers

  • Computer Vision.
  • Image Processing and Computer Vision.
  • Technical Research and Report Writing.