Lattice-Matched Epitaxial 3-N / M2AN Alloy Heterostructures

Abstract

This report presents a summary of the findings for the U. S. Naval Research Laboratory 6.1 basic research program Work Unit 1L59/991L59 on Lattice-Matched Epitaxial III-N / M2AN Alloy Heterostructures. Substantial progress was made in the molecular-beam epitaxial (MBE) growth of transition metal nitride (TMN) thin films of TiN, NbN, and TaN, as well as growth of Ti2AlN and Ta2AlN M2AN alloy materials. Greater understanding of the substrate temperature rise induced during growth of low emissivity metals on high emissivity substrates like sapphire and SiC was developed, along with new engineered absorbing layers to increase the radiative thermal coupling between the substrate heater and the substrate. New reproducible techniques were created to grow metal-polar III-N films on top of TMN films overcoming the natural tendency for III-N films to be N-polar on TMNs. The results in this program contributed several presentations at scientific meetings, publications in scientific journals, and to follow-on 6.1 and 6.2 research programs inside of NRL as well as ongoing and new externally funded research efforts.

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Document Details

Document Type
Technical Report
Publication Date
Jan 12, 2024
Accession Number
AD1218911

Entities

People

  • Douglas S. Katzer
  • Matthew T. Hardy
  • Neeraj Nepal

Organizations

  • United States Naval Research Laboratory

Tags

DTIC Thesaurus Topics

  • Crystal Lattices
  • Crystals
  • Electronics Laboratories
  • Epitaxial Growth
  • Films
  • Heterojunctions
  • High Temperature
  • Materials
  • Measurement
  • Military Research
  • Molecular Beam Epitaxy
  • Molecular Beams
  • Semiconductors
  • Silicon Carbide
  • Surface Chemistry
  • Thin Films
  • Transition Metals

Fields of Study

  • Materials science

Readers

  • Research Science/Academic Research
  • Semiconductor Device Technology
  • Systems Analysis and Design