Investigating the Mechanisms of Electrical Contact Resistance between the Diffusive and Ballistic Limits
Abstract
The original goal of this project was to investigate the mechanisms of electrical contact resistance (ECR) on small length scales through an interplay of conductive atomic force microscopy (C-AFM) experiments and atomistic simulations. This goal has been pursued, in the first half of the project period, by the following activities and accomplishments: (i) measuring ECR values between gold nano islands and graphite substrates, (ii) improving the C-AFM methodology in order to achieve more reliable and reproducible results, and (iii) understanding the physical mechanisms of the phenomenon of conduction aging we often observe in the experiments. In the second half of the project, our work evolved into the use of C-AFM as a powerful atomic-resolution imaging tool under ambient conditions, with exemplary results reported on various 2D materials as well as thin crystals of Mo2C, in collaboration with the TOBB University of Economics and Technology as well as Eskisehir Technical University (ETU). The results of the project have been shared with the scientific community by way of five journal publications and multiple invited as well as contributed presentations at conferences and research institutions.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 25, 2023
- Accession Number
- AD1231204
Entities
People
- Ashlie Martini
- Mehmet Z. Baykara
Organizations
- University of California