Thin Film Materials and Deposition Techniques for Infra-Red Coatings

Abstract

This report describes the coating materials and deposition techniques used for producing film systems in the mid-IR spectral region (2.0 - 14.0 micrometers) on Ge windows. It discusses the selection of coating materials and establishes the optical and physical properties of a low middle and high index film material suitable for film systems designed for use at 10.6 micrometers. Four IR coating designs were fabricated and their spectral characteristics compared to a computer generated tolerance analysis of the theoretical designs. For this work the following low index materials and mixtures were investigated to determine which would be the optimal choice: Calcium fluoride; Magnesium fluoride; Mixtures of CaF2,MgF2; Mixtures of CaF2, Al2O3; Glass, SiO2; Cryolite, Na3AlF6; and ZnS Tests for adhesion, abrasion and durability were made for each film.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1974
Accession Number
ADA002597

Entities

People

  • John J. Walls Jr.
  • Richard A. Mckyton

Organizations

  • Frankford Arsenal

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Adhesion
  • Coatings
  • Compound Semiconductors
  • Epitaxial Growth
  • Fabrication
  • Films
  • Materials
  • Materials Processing
  • Measurement
  • Optical Properties
  • Physical Properties
  • Reflectance
  • Refraction
  • Refractive Index
  • Resilience
  • Substrates
  • Thin Films

Fields of Study

  • Physics

Readers

  • Image Processing and Computer Vision.
  • Surface Coatings Technology.
  • Surface Engineering/Surface Coating Technology.