Structural Properties of Amorphous Semiconductors by Mossbauer Spectroscopy
Abstract
The Mossbauer effect in tellurium-125 was used to investigate the amorphous to crystalline transition in tellurium thin films. Techniques were developed for producing amorphous tellurium thin films and subsequently crystallizing them during the Mossbauer experiments. During the course of the work several Mossbauer tellurium sources were prepared and studied for narrow line high recoil-free fraction performance. Spectra of amorphous and crystalline tellurium films were compared in which the amorphous phase consistently showed an increased quadrupole splitting and a decreased recoil- free sample.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 31, 1974
- Accession Number
- ADA003511
Entities
People
- Charles Feldman
- Norman A. Blum
Organizations
- Johns Hopkins University