Laser Window Surface Finishing and Coating Technology

Abstract

Potassium chloride surfaces have been produced on reactive atmosphere processed (RAP) KCl using HCl etching which show an order of magnitude improvement in KCl surface damage resistance. Surface damage level approaches the bulk level in some KCl samples. An inverse dependence of 10.6 micrometer optical absorption on film deposition rate is reported for germanium films, beta of approximately 10/cm is reported for the best films. Ion beam sputtering of ThF4 using pure argon ion beams results in films deficient in fluorine having high optical absorption at 10.6 micrometers. Reactive sputtering in argon- fluorine gas mixtures may be required for producing stoichiometric fluoride films. Rutherford backscattering for chemical analysis of films and window surface structure promises to be a new powerful technique for such studies, using moderate beam energies of 180 KeV H(+) and 280 KeV H(++).

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1974
Accession Number
ADA003666

Entities

People

  • Morris Braunstein

Organizations

  • HRL Laboratories

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Antireflection Coatings
  • Chemical Vapor Deposition
  • Coatings
  • Diffraction
  • Infrared Lasers
  • Laser Applications
  • Lasers
  • Light Sources
  • Materials
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • Measurement
  • Optical Materials
  • Scattering
  • Single Crystals
  • Substrates

Fields of Study

  • Physics

Readers

  • Pulsed Power and Plasma Physics.
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers
  • Directed Energy - Pulsed-Laser Deposition