Ion Etching of Amorphous and Semicrystalline Fibers.

Abstract

Ion etching of amorphous and semicrystalline polymeric or graphite fibers produces structures which can be observed in either the transmission electron microscope or the scanning electron microscope. The structures so produced have previously been identified as resulting from the etching process (artifacts), or as representing characteristics of the material, or both. The artifacts can be eliminated or minimized by rotating the sample during irradiation, using a low angle of incidence, and ensuring that the temperature of the sample surface remains low. When such precautions are used, amorphous fibers and semicrystalline fibers which are not oriented remain featureless after ion etching. Oriented semicrystalline fibers, however, develop a striated structure which is oriented perpendicular to the stretch direction. These transverse structural features reflect characteristic features of drawn fibers; but the relation between these features and the lamellar spacing is unclear.

Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1975
Accession Number
ADA004659

Entities

People

  • D. R. Uhlmann
  • L. H. Peebles Jr.
  • S. B. Warner

Organizations

  • Massachusetts Institute of Technology

Tags

DTIC Thesaurus Topics

  • Angle Of Incidence
  • Artifacts
  • Buildings And Structures
  • Electron Microscopes
  • Electrons
  • Graphitic Materials
  • Low Angles
  • Materials
  • Microscopes
  • Optical Equipment
  • Optical Magnification Devices
  • Scanning
  • Scanning Electron Microscopes
  • Transverse

Fields of Study

  • Materials science

Readers

  • Nanofabrication and Microfabrication.
  • Reinforced Composite Materials
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Space
  • Space - Hall-Effect Thruster