The Influence of Ion Implantation on the Surface Properties of Metals and Alloys.

Abstract

A method for improving the depth resolution in Rutherford scattering measurements is presented. The application of the method is demonstrated by measurements of the range of heavy ions in silicon and aluminum and of the range distriction of Pb in silicon.

Document Details

Document Type
Technical Report
Publication Date
Oct 30, 1974
Accession Number
ADA004838

Entities

People

  • G. Carter
  • W. A. Grant

Organizations

  • University of Salford

Tags

DTIC Thesaurus Topics

  • Aluminum
  • Charged Particles
  • Implantation
  • Ion Implantation
  • Ions
  • Measurement
  • Metals
  • Scattering
  • Surface Properties

Fields of Study

  • Physics

Readers

  • Thin Film Deposition Science.