A Photolithographic Process to Produce Photomasks for Surface Wave Transducers.
Abstract
A process to produce photomask masters used in the production of surface wave transducers was developed and is described. Masters were to be clear pattern in achrome field on 7-mil glass with nominal 1.2 micrometer line and space widths with uniform electrode spacing in both apodized and unapodized patterns. Equipment limitations, processing techniques, and materials evaluated are discussed. Production of chrome masters on 60-mil glass was established. Consistent production on 7-mil glass requires additional development.
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 13, 1974
- Accession Number
- ADA006124
Entities
People
- Thomas H. Lewis