Investigation of Advanced Protective and Antireflection Coatings for Halide Optics
Abstract
The design and assembly of the radio frequency glow discharge and ultraviolet photolysis equipment for the polymerization of organic monomers on potassium chloride laser windows has been completed. The ultraviolet photolysis chamber has been modified to permit glow discharge cleaning of the potassium chloride prior to the polymeric deposition. Deposition by a combination of glow discharge and ultraviolet photolysis is also possible. Preliminary polymer depositions using the photolytic chamber were conducted. Chemical polishing studies were initiated using n-butyl and isopropyl alcohols and a Syntron Polisher, both with and without polishing powders. Surface removal rates of about 600 A/minute were established.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 19, 1973
- Accession Number
- ADA008034
Entities
People
- Bernard L. Weigand
- Theodore J. Lachapelle Jr.