A Model for the Discharge of Radiation-Induced Space Charge in MOSFET's.
Abstract
Rapid annealing of the positive space charge in irradiated Si-SiO2 metal systems is due to Quantum mechanical tunneling of electrons from the valance band to the trapped hole. The annealing factor increases and the total effect is reduced at all times by lower temperature processing or any technique which concentrates the traps near the interfaces.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1975
- Accession Number
- ADA008855
Entities
People
- R. J. Maier
Organizations
- Air Force Research Laboratory