Conduction Mechanisms in Thick Film Microcircuits

Abstract

The sintering kinetics and the ripening kinetics for RuO2 particles in the presence of a glass phase were studied by measuring surface area, X-ray line broadening, shrinkage, and electrical resistance. Results from these four techniques are interpreted in terms of competing processes which occur during thick film resistor firing. The sheet resistance of thick film resistors as a function of RuO2/glass ratios is reported.

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Document Details

Document Type
Technical Report
Publication Date
Dec 31, 1974
Accession Number
ADA008862

Entities

People

  • R. W. Vest

Organizations

  • Purdue Research Foundation

Tags

Communities of Interest

  • Energy and Power Technologies
  • Space

DTIC Thesaurus Topics

  • Electric Charge
  • Electrical Properties
  • Electrical Resistance
  • Film Resistors
  • Films
  • Materials
  • Materials Engineering
  • Materials Processing
  • Materials Science
  • Measurement
  • Particle Size
  • Physical Properties
  • Resistance
  • Resistors
  • Thermal Expansion
  • Thick Films
  • X Rays

Readers

  • Materials Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene