Techniques for the Microfabrication of Integrated Optical Waveguide Couplers

Abstract

During this quarter progress was made toward accomplishing the objective of this program, namely, the development of an electron-beam projection exposure system (EPES) capable of producing integrated optical circuits. Efforts were concentrated on basic improvements in the electron exposure system to increase the area of exposure for a single pattern and to develop methods of producing multiple-registered exposure patterns. The results obtained thus far are: (1) The EPES illumination system has been improved to provide an area of illumination 100% larger than that of the previous system; (2) A rotary mask holder has been designed, which will allow the formation of up to eight different registered exposure patterns. Concentrated research work has also been carried out to develop the transmission mask fabrication technology to allow reproducible electron-beam mask construction.

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Document Details

Document Type
Technical Report
Publication Date
Nov 24, 1975
Accession Number
ADA011492

Entities

People

  • E. R. Westerberg

Organizations

  • SRI International

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Construction
  • Couplings
  • Diameters
  • Electron Beam Lithography
  • Electron Beams
  • Electrons
  • Fabrication
  • High Resolution
  • Illumination
  • Military Research
  • Optical Circuits
  • Optical Waveguides
  • Optoisolators
  • Photonic Integrated Circuits
  • Sine Waves
  • Waveguide Couplers
  • Waveguides

Fields of Study

  • Physics

Readers

  • Electronics Engineering
  • Image Processing and Computer Vision.
  • Systems Analysis and Design

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene