A Comparison of 10.6 micrometer Pulsed Laser Damage in Sputtered vs Electron Beam Deposited Ge-Coated KCl,

Abstract

Germanium films deposited on KCl substrates by electron beam and sputter techniques have been irradiated at 10.6 micrometers. A comparative damage study of germanium films prepared by these techniques under pulsed apparatus was used for this study. Well characterized RAP Bridgeman and Czochralski grown KCl substrates with (100) and (111) orientation were used.

Document Details

Document Type
Technical Report
Publication Date
Jun 18, 1975
Accession Number
ADA011610

Entities

People

  • A. Golubovic
  • D. Milam
  • J. Bruce
  • J. Comer
  • W. Ewing

Organizations

  • Air Force Cambridge Research Laboratories

Tags

DTIC Thesaurus Topics

  • Damage
  • Electron Beams
  • Electrons
  • Germanium
  • Laser Damage
  • Lasers
  • Micrometers
  • Orientation (Direction)
  • Pulsed Lasers
  • Substrates

Readers

  • Materials Science and Engineering.
  • Optical Physics and Photonics.
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene