Titanium-Aluminum Ultra-Thin Film Deposition Study.
Abstract
A process was developed for the vacuum deposition of multilayer titanium-aluminum films at a rate of one pound per hour. Source tooling was developed. Multi-titanium-aluminum films were vacuum deposited and removed from the substrate. Means of smoothing the substrate and releasing the multilayer thin films from the substrate were investigated.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 24, 1975
- Accession Number
- ADA013584
Entities
People
- E. J. Torok
- M. C. Paul
- R. H. Dean
- S. J. Lins