Mechanisms and Inhibition of Dealloying in an Alpha Brass.

Abstract

Dealloying of a single-phase binary alpha brass in pH 4, 0.1M chloride solution was investigated in terms of the operative mechanism. Selective leaching of zinc from the brass was produced under conditions of cathodic polarization. Auger electron spectroscopy was employed to measure composition versus depth profiles of the resulting zinc-depleted surface layers. The selective leaching mechanism was found to be based on enhanced volume diffusion of zinc to the brass surface. Dealloying by dissolution of the brass as a whole, followed by redeposition of the copper, was found to occur exclusively under occluded cell conditions. The mechanism was examined in terms of the copper-chloride equilibria established at the dissolving brass surface. The redeposition of copper was found to proceed by reduction of cuprous chloride near the brass surface. The inhibitive effect of arsenic was determined to be the prevention of the cuprous chloride reduction reaction.

Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1975
Accession Number
ADA015097

Entities

People

  • William Clarence Fort Iii

Organizations

  • University of Florida

Tags

DTIC Thesaurus Topics

  • Auger Electron Spectroscopy
  • Auger Electrons
  • Chlorides
  • Dealloying
  • Electron Spectroscopy
  • Electrons
  • Inhibition
  • Leaching
  • Spectroscopy

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene