Structure and Electrical Properties of RF Sputter Deposited Indium Antimonide Thin Films

Abstract

During the last few years, sputtering has become a very important industrial technique for depositing thin films. Typical applications include metalization and passivation in the electronics industry, the deposition of complex cermets, glasses, and plastics, and the formation of coatings for corrosion, abrasion, and wear resistance. However, relatively little work has been reported on the growth of compound semiconducting films by sputtering.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1975
Accession Number
ADA019575

Entities

People

  • Charles Edward Wickersham Jr.

Organizations

  • University of Illinois Urbana–Champaign

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Auger Electrons
  • Chemical Analysis
  • Chemistry
  • Crystals
  • Electrical Measurement
  • Electrical Properties
  • Electron Mobility
  • Electronics Industry
  • Epitaxial Growth
  • Grain Size
  • Materials
  • Measurement
  • Scattering
  • Thin Films
  • Transition Temperature
  • Transitions

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene