X-Ray Lithography System (Complete with Interdigital Transducer Master).
Abstract
The report describes the design and fabrication of an x-ray lithography system for the fabrication of surface acoustic wave devices. Research was conducted on a beryllium x-ray window, a 10 kV, 33 mA, Pierce-geometry electron gun, a heat-pipe-cooled aluminum target, a helium-filled exposure chamber, an x-ray flux monitoring system, and a silicon membrane x-ray mask with 0.5 micrometer thick gold absorber patterns consisting of three interdigital transducers with 0.5 micrometer wide lines and spaces. Research results and test data are included in the report. The report also describes the fabrication and testing of a complete system which provides an exposure flux of 2 J/sq cm at the resist (suitable for polymethylmethacrylate resist) in 2 hours with a penumbral shadow of only 0.2 micrometer for a 2.54 cm target-to-mask distance and a 5 micrometer mask-to-substrate gap.
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 01, 1975
- Accession Number
- ADA020354
Entities
People
- Paul A. Sullivan
Organizations
- HRL Laboratories