Gold-Aluminum Interdiffusion Phenomena in Thin-Film Couples.
Abstract
The experiments carried out during the past year showed (1) that it was possible to identify the various Au/Al phases that form in polycrystalline films during interdiffusion at high temperatures using transmission electron diffraction techniques; (2) that the formation of intermetallic phases in gold-aluminum bilayers introduces severe strains in the films; (3) that most polycrystalline bilayer films tend to have microstructures that do not lend themselves to carrying out high resolution transmission electron microscopy in a satisfactory manner; (4) that epitaxial Al films can be grown at room temperature on epitaxial Au films originally formed on NaCl; and (5) that such monocrystalline bilayers are much better forms of these materials to use for transmission electron diffraction work. The ultimate objective of this particular study is the evaluation of the effects of gaseous impurities on interdiffusion in gold-aluminum junctions; this is a process relating to the failure of gold-aluminum junctions in microelectronic circuits.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 01, 1975
- Accession Number
- ADA020449
Entities
People
- Richard W. Vook
Organizations
- Syracuse University