Inert Carrier Process Application to HMX Nitrolysis and Recrystallization. Volume I. DADN-HMX Chemistry
Abstract
The application of the ICP to the nitrolysis of HMX was studied. The feasibility on bench scale and pilot plant scale was demonstrated. Design parameters for a complete continuous ICP pilot plant were obtained for the production of crude HMX via DAPT-DADN-HMX technology. Each chemical step was made in the present CSD pilot plant under continuous process conditions.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 16, 1976
- Accession Number
- ADA023273
Entities
People
- J. F. Schimscheimer
Organizations
- United Technologies Corporation