Ion Beam Sputtering of Infrared Optical Materials

Abstract

The sputter yield and morphological characteristics of materials commonly employed for infrared optical elements is described. A method to utilize a numerically controlled low energy ion beam to figure and polish infrared optical elements is presented. This method is capable of forming highly accurate large aperture optical elements without degrading optical performance by the introduction of trace impurities.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1975
Accession Number
ADA024649

Entities

People

  • C. Bianchi
  • H. Gelles
  • J. D. Lester

Organizations

  • Frankford Arsenal

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Computer Programs
  • Crystal Structure
  • Crystals
  • Fabrication
  • Impurities
  • Infrared Optical Materials
  • Instrumentation
  • Interferometers
  • Ion Beams
  • Ion Bombardment
  • Materials
  • Optical Materials
  • Optics
  • Physical Properties
  • Polycrystals
  • Scattering
  • Surface Roughness

Fields of Study

  • Physics

Readers

  • Image Processing and Computer Vision.
  • Nanofabrication and Microfabrication.
  • Spectroscopy.