Technology and Physics of Infrared and Point Contact Diodes

Abstract

Background work for this contract, performed by this laboratory, has shown that tunneling characteristics of junctions formed by a very thin dielectric layer sandwiched between two metals is independent of frequency (from DC through 10 micrometers wave length). Principal work done this period was on the optical response of Al-Al2O3-Al junctions. These demonstrated characteristic photoemission response with considerable bolometric effect. An analysis of the data showed that the model is consistent with experimental results and correctly predicts behavior at lower frequencies. Work was done on Al-Al2O3-Pb junctions in the far infrared at liquid nitrogen and liquid helium temperatures; equipment difficulties precluded obtaining new information. Three talks were given and three articles submitted for publication during this period.

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Document Details

Document Type
Technical Report
Publication Date
Mar 01, 1976
Accession Number
ADA025330

Entities

People

  • Ali Javan

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aluminum Oxides
  • Argon Lasers
  • Contracts
  • Detection
  • Dielectrics
  • Electron Tubes
  • Electronic Circuits
  • Elements
  • Emission
  • Frequency
  • Klystrons
  • Measurement
  • Metal Oxides
  • Photoelectric Emission
  • Radio Frequency
  • Radio Frequency Power
  • Thin Films

Fields of Study

  • Physics

Readers

  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Superconducting Magnet Technology
  • Technical Research and Report Writing.