III-V Surface Studies.

Abstract

A studies program has been carried out on the surfaces of III-V compounds with the purpose of understanding how their surface properties, structural, chemical, and electronic, relate to efficient photoemission. In particular, the development and characteristics of the negative electron affinity (NEA) surface, activated by the adsorption of cesium and oxygen, have been investigated. The materials studied were GaAs, Ga(X)In(1-x)As, InSb, InP, and AlAs; they were chosen to represent, as broadly and as feasibly as possible, the family of commonly used III-V semiconductors in terms of bandgap and constitutent atom size. For each of these materials, three primary crystallographic faces were studied, the (100), (111A), and (111B). The primary investigatory tools used were Low Energy Electron Diffraction (LEED), Auger Electron Spectroscopy (AES), Quadrupole Mass Analysis (QMA), photoemission measurements, and temperature. Most of the detailed characterization of the step-by-step development of the NEA surface was done on GaAs. (Author)

Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1975
Accession Number
ADA026710

Entities

People

  • Bernard Goldstein

Organizations

  • RCA Corporation

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Auger Electron Spectroscopy
  • Auger Electrons
  • Diffraction
  • Electron Diffraction
  • Electron Spectroscopy
  • Electrons
  • Materials
  • Photoelectric Emission
  • Semiconductors
  • Spectra
  • Spectroscopy
  • Surface Properties

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Systems Analysis and Design
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics