Diffusion Dans Les Semiconducteurs du Groupe IV (Diffusion in Semiconductors of Group IV),
Abstract
The quantities which theoretically and experimentally characterize diffusion are briefly reviewed and discussed. Emphasis is placed on the difficulties in reconciling theory and experiment; in particular it is noted that self-diffusion in silicon is still a matter of controversy. The different aspects of charge state effects on diffusion are discussed in detail. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1976
- Accession Number
- ADA029319
Entities
People
- J. Bourgoin
- J. W. Corbett
Organizations
- State University of New York at Albany