Reliability Evaluation of ECL Microcircuits.

Abstract

The objective of this study was to undertake a detailed analysis and reliability evaluation of ECL microcircuits available for use in high speed digital circuits. Special emphasis was placed on the effects of electromigration. The selected devices included SSI and MSI integration, one and two level metallization from a total of four major vendors. Metallization included aluminum with a silicon dopant, aluminum with copper and silicon dopants and pure aluminum with a titanium-tungsten barrier. Detail construction analysis and electrical characterization including thermal resistances were performed on all devices. Devices which failed during the performance of life testing were electrically categorized and physically analyzed to establish failure modes and mechanisms.

Document Details

Document Type
Technical Report
Publication Date
Jun 01, 1976
Accession Number
ADA029737

Entities

People

  • A. A. Capobianco
  • D. Bartels
  • E. T. Lewis

Organizations

  • Raytheon Missiles & Defense

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aluminum
  • Circuits
  • Construction
  • Digital Circuits
  • Elements
  • Failure Mode And Effect Analysis
  • Metals
  • Microcircuits
  • Reliability
  • Resistance
  • Test And Evaluation
  • Thermal Resistance
  • Titanium
  • Tungsten

Fields of Study

  • Engineering

Readers

  • Integrated Circuit Design and Technology.
  • Systems Analysis and Design
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics