Noncoplanar High Power FET.
Abstract
Buried-insulating-layer, noncoplanar FETs have been fabricated by growth of insulating regions into GaAs substrates and subsequent processing to produce transistors for which the substrate becomes the common source electrode. These devices were operated as amplifiers up to 7 GHz, trap-filled-limit (TFL) breakdown was observed for the O2-doped insulating material with the drain biased positive. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 19, 1975
- Accession Number
- ADA032809
Entities
People
- D. R. Decker
- S. G. Bandy