Development of Apparatus for Performing Rapid Capacitance-Voltage Measurements on MIS Structures.
Abstract
This report discusses the design of a complete experimental system for the observation of radiation effects in metal-insulator-semiconductor (MIS) CAPACITORS BY USE OF A RAPID, REPETITIVE CAPACITANCE-VOLTAGE (C-V) measurement technique. The apparatus includes trigger and control-signal generators, bias voltage sources, a sample holder with temperature control and radiation dosimetry, and a high-speed sample capacitance monitor. In typical operation, this apparatus repetitively measures the C-V characteristics of an MIS capacitor at intervals spaced logarithically in time from 0.1 ms to 800 s, after a radiation pulse. Characteristics and operating principles of the major system components are discussed and sample test results are presented. (author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 01, 1976
- Accession Number
- ADA035249
Entities
People
- H. Edwin Boesch Jr
Organizations
- Harry Diamond Laboratories