Application of Bethe's Theory on Electron Scattering to E-Beam Lithography.
Abstract
In this report, attention is focused on the question of the spatial extent developed by an intermediate energy (5-20 keV) scattered electron beam in a lithographic e-beam resist material. Use is made of the multiple scattering theory of Bethe to calculate the average cosine between the actual direction of motion and the direction of the primary electron beam in terms of the average nuclear charge of the target and the depth of electron penetration into the target. Use is made of the average cosine calculation to establish an order-of-magnitude expression for the depth at which two electron-beam lines overlap to cause undercutting. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1977
- Accession Number
- ADA036124
Entities
People
- Arthur D. Ballato
- Gerald J. Iafrate
- John N. Helbert
- Walter S. Mcafee
Organizations
- United States Army Communications-Electronics Command