Study of Electronic Transport and Breakdown in Thin Insulating Films

Abstract

Recent progress is reported on an ongoing program of studies of high- field electronic injection, transport, trapping, and dielectric breakdown in thin insulating films. The studies include the use of combined corona and optical techniques for the investigation of carrier injection, transport, and trapping; a study of the charge-carrier recombination properties of SiO2 and the Si-SiO2 interface; an investigation of the high-field generation of electron traps in MOS structures; a study of high-field breakdown effects in aluminum oxide; and an investigation of electron-beam-induced interface states in the Si- SiO2 system.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1976
Accession Number
ADA038085

Entities

People

  • Walter C. Johnson

Organizations

  • Princeton University

Tags

Communities of Interest

  • Advanced Electronics
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Aluminum Oxides
  • Charge Carriers
  • Chemical Vapor Deposition
  • Electric Fields
  • Electrical Engineering
  • Electron Beams
  • Electron Density
  • Electrons
  • Energy Bands
  • Energy Levels
  • Ionizing Radiation
  • Light Sources
  • Measurement
  • Photoelectric Emission
  • Quantum Yields
  • Radiation
  • Silicon Dioxide

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Pulsed Power and Plasma Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene