The Effects of Substrate Composition of Thick Film Circuit Reliability.
Abstract
Studies of the rate of the dissolution of 96% Al2O3 substrates (AlSiMag 614) in a model glass (70% PbO, 20% B2O3, 10% SiO2) were conducted as a function of temperature from 750 to 1000 C. The rate limiting steps were found to be phase boundary reaction rate control at short times and diffusion through a boundary layer under natural convection at longer times. The rate equations developed from the experimental data allow the prediction of the total quantity of substrate dissolved in the resistor glass under any processing conditions.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 28, 1977
- Accession Number
- ADA038340
Entities
People
- R. W. Vest
Organizations
- Purdue University