Modeling Validation, Techniques and Applications for X-Ray Lithography.
Abstract
The experimental development of soft X-ray lithography in conjunction with fabrication of blazed diffraction gratings is discussed. Interferometically produced gold masks on thin silicon windows and a technique for protecting the mask during etching of the window are described. Images resulting from a multiple source angle exposure technique are shown in support of this technique as a workable concept. Prints of Ni grids and sub-micron period Au gratings on thin silicon windows are also shown. The constructive use of thermal effects during both exposure and development are also considered. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1976
- Accession Number
- ADA042019
Entities
People
- A. R. Neureuther
- P. I. Hagouel
Organizations
- University of California, Berkeley