Photoelectric and Work Function Studies of the Si(100)-Cs/F Surface.

Abstract

The work function, photoelectric and structural information obtained in this experiment are combined to provide a rather complete model of the adsorption of CsF on the Si(100) surface. It is shown that a work function low enough for NEA can be achieved by CsF and Cs depositions. This is believed to be important because it suggests the possibility of straight forward reactivation of surfaces in a sealed-off system. (Author)

Document Details

Document Type
Technical Report
Publication Date
Apr 01, 1977
Accession Number
ADA042047

Entities

People

  • F. J. Kub

Organizations

  • University of Minnesota

Tags

DTIC Thesaurus Topics

  • Adsorption
  • Functions (Mathematics)
  • Work Functions

Readers

  • Pulsed Power and Plasma Physics.
  • Semiconductor Device Technology
  • Systems Analysis and Design