Chemical Vapor Deposition of Silicon Nitride.

Abstract

Experimental work during the past year has established the basic processing outlines for the deposition of crystalline alpha-Si3N4 plates and dome geometries. Preliminary correlations between critical processing variables and microstructure have been established. Property evaluations of deposits include: flexure strength, Young's moduli, thermal expansion, electromagnetic transmittance and reflectance, microhardness and fracture toughness deduced from identation and grooved double-cantilever beam experiments. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1977
Accession Number
ADA045536

Entities

People

  • J. J. Gebhardt
  • J. O. Hanson
  • R. A. Tanzilli

Organizations

  • General Electric

Tags

Communities of Interest

  • Advanced Electronics
  • Weapons Technologies

DTIC Thesaurus Topics

  • Ceramic Materials
  • Chemical Vapor Deposition
  • Chemistry
  • Dielectric Properties
  • Materials
  • Materials Laboratories
  • Materials Science
  • Measurement
  • Mechanical Properties
  • Mechanical Working
  • Mechanics
  • Military Research
  • Modulus Of Elasticity
  • Optical Properties
  • Physical Properties
  • Physics Laboratories
  • Test Methods

Readers

  • Materials Science (Mechanical Engineering).
  • Reinforced Composite Materials
  • Surface Engineering/Surface Coating Technology.