Small Scale Discharge Studies

Abstract

This report discusses the discharge physics and the formation and quenching processes in typical XeF laser mixtures. We have determined that the discharge physics is dominated by electron impact excitation and ionization of the rare gas metastables. The ionization of the metastables impacts the discharge stability directly while their excitation strongly affects the efficiency of producing XeF*. From our discharge experiments we have determined that Xe (6p) states react with NF3 to produce XeF* with a branching ratio of 0. 7. The rate constant for this reaction is .0004 cub.cm/sec. The formation and quenching processes have been determined by analyzing the dependence of (B2 Sigma(+)1/2 goes to X2 Sigma(+)1/2 radiation on the partial pressures of Ar, Xe, and F2. In the experiments the XeF* was produced by a high energy e-beam. We have determined the two and three body quenching rates by Ar to be 8 + or - 4x10 to the -13th cc/sec and 1.5 + or - 0.5 x 10 to the -32nd cm to the 6th/sec. Xe quenches XeF* with a three body rate of 3 + or - 1.5 x 10 to the -31st cm to the 6th/sec; the third body was mainly argon.

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Document Details

Document Type
Technical Report
Publication Date
Aug 31, 1976
Accession Number
ADA047220

Entities

People

  • J. A. Mangano
  • J. H. Jacob
  • M. Rokni

Tags

Communities of Interest

  • Energy and Power Technologies
  • Space
  • Weapons Technologies

DTIC Thesaurus Topics

  • Air Force
  • Capacitors
  • Chemistry
  • Electron Beams
  • Electron Energy
  • Electrons
  • Emission Spectra
  • Ionization
  • Laser Pulses
  • Lasers
  • Measurement
  • Partial Pressure
  • Physics
  • Quantum Efficiency
  • Radiation
  • Security
  • Spectra

Fields of Study

  • Physics

Readers

  • Molecular Photonics/Laser Physics

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers
  • Microelectronics
  • Microelectronics - Graphene