The Effect of Ion Irradiation on the Intrinsic Stress and Substrate Adhesion of Germanium Films.

Abstract

Irradiation with argon ions is shown to increase greately the adhesion of vacuum evaporated Germanium films on glass and other substrates. The observations suggest that the effect is due to the penetration of Ge atoms into the substrate after collison with the energetic ions. In addition, the intrinsic stress of films deposited under ion bombardment is found to be substantially lower than that of similar fimls, produced without simultaneous irradiation. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1977
Accession Number
ADA048019

Entities

People

  • E. H. Hirsch
  • I. K. Varga

Tags

Communities of Interest

  • Advanced Electronics
  • Weapons Technologies

DTIC Thesaurus Topics

  • Adhesion
  • Bonding
  • Classification
  • Collisions
  • Current Density
  • Department Of Defense
  • Energy
  • Evaporation
  • Films
  • Germanium
  • Ion Beams
  • Ion Bombardment
  • Ions
  • Materials
  • Security
  • Substrates
  • Thin Films

Fields of Study

  • Physics

Readers

  • Pulsed Power and Plasma Physics.
  • Semiconductor Device Technology
  • Surface Engineering/Surface Coating Technology.