IC Fabrication Using Electron-Beam Technology.

Abstract

The technical and economic impact of electron-beam direct slice printing will be demonstrated on 256-bit bipolar RAMs. All electron-beam tapes necessary for fabricating the 256-bit bipolar RAMs have been generated. Advanced software techniques such as geometry sizing, sorting and increment/decrement were used. E-beam processes have been developed for all lithographic steps on the 256-bit bipolar RAMs. Because of the pattern distortion at epitaxial growth, the original alignment marker system was modified. Several lots using this new alignment marker system are in process. The design of the Automatic Slice Loader is complete. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1977
Accession Number
ADA048307

Entities

People

  • Gilbert L. Varnell
  • John L. Bartelt
  • Roger A. Robbins
  • Ronald A. Williamson
  • Terry L. Brewer

Organizations

  • Texas Instruments

Tags

DTIC Thesaurus Topics

  • Access Time
  • Automatic
  • Circuits
  • Economic Impact
  • Electron Beams
  • Electrons
  • Epitaxial Growth
  • Etching
  • Fabrication
  • Failure Mode And Effect Analysis
  • Geometry
  • Magnetic Tape
  • Manufacturing
  • Materials
  • Metals
  • Security
  • Semiconductor Manufacturing

Fields of Study

  • Physics

Readers

  • Computer Science.
  • Nanofabrication and Microfabrication.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene