Pitting in Aluminum.

Abstract

Observations by electron microscopy of transient pitting during film growth in the passive state were extended to a lower potential. Electrochemical studies in sulfuric acid of the effect on cathode behavior of copper contents from 0.1 to 600 ppm showed that cathode polarization decreases with time, that corrosion potential rises with time and that the effect is accelerated by chloride additions and can be substantial even at 1 ppm Cu. It is proposed that the formation of cathodes of copper during corrosion occurs in transient pits. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Aug 19, 1977
Accession Number
ADA049854

Entities

People

  • M. Metzger

Organizations

  • University of Illinois Urbana–Champaign

Tags

DTIC Thesaurus Topics

  • Aluminum
  • Buildings And Structures
  • Chemical Compounds
  • Chemistry
  • Chlorides
  • Corrosion
  • Corrosion Resistance
  • Crystal Structure
  • Electron Microscopy
  • Grain Boundaries
  • Materials
  • Metallurgy
  • Microscopy
  • Military Research
  • Observation
  • Resistance
  • Solid Solutions

Readers

  • Atmospheric Science / Meteorology, specifically Wind Wave Turbulence.
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene