Metastable Metallic Superconductors with High Transition Temperatures and Composite Superconductors.

Abstract

Chemical vapor deposition (CVD) was found to be a practical method for preparing large quantities of Nb-Ge. The fabrication of Nb-Ge multifilamentary and tape conductors by this method was shown to be feasible. CVD Nb-Ge had critical temperatures and upper critical fields comparable to the sputtered material. Critical-current densities were lower. Second-phase doping was shown effective toward improving current-carrying capacity. A new Nb-Ge growth method (reactive sputtering of niobium in Argon/Germane) was demonstrated and its applicability for use in a magnetron sputtering system evaluated. A study of the effect of impurities (oxygen, nitrogen and silicon) on sputtered Nb-Ge films indicated that each of these impurities can stabilize the high-critical temperature metastable A15 phase. An investigation of the bronze diffusion process illustrated why A15 Nb-Ge cannot readily be made by this method. The formation of A15 Nb-Ga by bronze diffusion was achieved. The preparation of superconducting niobium and A15 structure Nb-Sn was accomplished by liquid sodium reduction of the halides. The anomalously high upper critical field of sputtered NbN film was shown to be due to a surface critical field. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Dec 31, 1977
Accession Number
ADA050055

Entities

People

  • John R. Gavaler
  • Michael R. Daniel

Tags

Communities of Interest

  • Advanced Electronics
  • C4I
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Air Force
  • California
  • Chemical Vapor Deposition
  • Critical Temperature
  • Current Density
  • Electron Diffraction
  • Electron Microscopes
  • Electron Microscopy
  • Films
  • Materials
  • Mechanical Properties
  • New York
  • Sputtering
  • Thin Films
  • Transition Temperature
  • United States
  • Vapor Deposition

Fields of Study

  • Physics

Readers

  • Superconducting Magnet Technology
  • Thin Film Deposition Science.