IC Fabrication Using Electron-Beam Technology.

Abstract

Slice processing and process development on the 256-bit bipolar RAMs has continued this quarter. Four lots of bipolar RAMs are presently in process and the oxidation, epitaxial and diffusion parameters from these lots have been measured. A comparison between the measured parameters and their specified values has been made. The processes from polished substrate through DUF O.R. have been significantly modified to reduce cost and processing steps. Work on improving the alignment marker process is continuing. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1978
Accession Number
ADA052355

Entities

People

  • Gilbert L. Varnell
  • John L. Bartelt
  • Roger A. Robbins
  • Ronald A. Williamson
  • Terry Brewer

Organizations

  • Texas Instruments

Tags

Communities of Interest

  • Advanced Electronics
  • Cyber
  • Sensors

DTIC Thesaurus Topics

  • Assembly
  • Barometric Pressure
  • Cost Reductions
  • Costs
  • Diffusion
  • Electron Beams
  • Electronics
  • Electrons
  • Fabrication
  • High Density
  • Low Temperature
  • Manufacturing
  • New Jersey
  • Oxidation
  • Oxides
  • Rocket Oxidizers
  • Semiconductor Manufacturing

Readers

  • Geodesy
  • Integrated Circuit Design and Technology.
  • Powder metallurgy of Titanium alloys.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene